Handbook Of Vlsi Microlithography

Author: William B. Glendinning
Publisher: William Andrew
ISBN: 1437728227
Size: 44.55 MB
Format: PDF
View: 3862
Download Read Online
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Handbook Of Chemical Vapor Deposition

Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 1437744885
Size: 21.69 MB
Format: PDF, Kindle
View: 4459
Download Read Online
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

Cleaning And Surface Conditioning Technology In Semiconductor Device Manufacturing 10

Author: Takeshi Hattori
Publisher: The Electrochemical Society
ISBN: 156677568X
Size: 69.67 MB
Format: PDF
View: 3986
Download Read Online
This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.

Handbook Of Industrial Refractories Technology

Author: Stephen Caniglia
Publisher: William Andrew
ISBN: 0815517564
Size: 60.31 MB
Format: PDF, Kindle
View: 2503
Download Read Online
Encompasses the entire range of industrial refractory materials and forms: properties and their measurement, applications, manufacturing, installation and maintenance techniques, quality assurance, and statistical process control.

Vlsi Handbook

Author: Norman Einspruch
Publisher: Academic Press
ISBN: 0323141994
Size: 49.96 MB
Format: PDF, ePub, Docs
View: 1776
Download Read Online
VLSI Handbook is a reference guide on very large scale integration (VLSI) microelectronics and its aspects such as circuits, fabrication, and systems applications. This handbook readily answers specific questions and presents a systematic compilation of information regarding the VLSI technology. There are a total of 52 chapters in this book and are grouped according to the fields of design, materials and processes, and examples of specific system applications. Some of the chapters under fields of design are design automation for integrated circuits and computer tools for integrated circuit design. For the materials and processes, there are many chapters that discuss this aspect. Some of them are manufacturing process technology for metal-oxide semiconductor (MOS) VLSI; MOS VLSI circuit technology; and facilities for VLSI circuit fabrication. Other concepts and materials discussed in the book are the use of silicon material in different processes of VLSI, nitrides, silicides, metallization, and plasma. This handbook is very useful to students of engineering and physics. Also, researchers (in physics and chemistry of materials and processes), device designers, and system designers can also benefit from this book.

In Situ Monitoring Of Aquatic Systems

Author: Jacques Buffle
Publisher: Wiley
ISBN: 9780471489795
Size: 57.34 MB
Format: PDF, ePub, Docs
View: 2117
Download Read Online
This outstanding volume enables researchers to develop robust sensors and instruments for automatic 'on site' measurement of water quality. The need for an efficient multi-parameter monitoring system is ever-increasing, given that human activity is impacting so greatly on ecosystems and the increased need to develop our understanding of the underlying environmental processes. Edited by two renowned experts, this book evaluates developments over the last 10-20 years which will form the basis of future sophisticated in situ monitoring systems. The emphasis is on micro-analytical monitoring techniques and microtechnology. * Critically discusses the state of the art of existing techniques and devices * Overviews what can be expected in terms of performance * Outlines possible improvements in the future This book will be invaluable to both researchers interested in the development of environmental monitoring systems and laboratories in charge of water quality assessment by providing them with a critical evaluation of existing and possible future options.

Books In Print

Size: 78.35 MB
Format: PDF, Docs
View: 1712
Download Read Online
Books in print is the major source of information on books currently published and in print in the United States. The database provides the record of forthcoming books, books in-print, and books out-of-print.